SPUTTERING TARGET MATERIAL

Molybdenum sputtering target, magnetron sputtering target, copper sputtering target, gold sputtering target materials are critical components in the process of sputtering, a widely used technique in the physical vapor deposition (PVD) of thin films. This custom sputtering targets process is essential in the fabrication of semiconductor devices, solar panels, optical components, and many other applications where thin layers of sputtering target material need to be deposited with high precision and uniformity.

Type of Sputtering Target Material

Sputtering Target Material

Titanium Target

Zirconium Target

Titanium-Aluminum Alloy Target

Chromium Target

ADVANTAGES OF SPUTTERING TARGET MATERIAL

Advantages of Sputtering Target Material

1. High-Quality Film Deposition